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Back-Side Electron-Bombarded Silicon pin-Strip

https://doi.org/10.32603/1993-8985-2019-22-5-80-92

Abstract

Introduction. In recent decades, in the field of photoelectronics, special attention has been paid to the development of semiconductor matrix photodetectors. These detectors have become an effective alternative to existing television receiving systems. Among such devices, linear position-sensitive sensors are used in cases where the rapid registration of changes to the environment is required (for instance, high-speed locators for flying vehicles).

Aim. To develop a strip of silicon pin-diodes as part of a hybrid IR-detector for effective registration of photoelectrons with time resolution less than 10 ns, as well as to model the key electro-physical characteristics of the strip.

Materials and methods. In the device under development, the registration of photoelectrons is achieved by the presence of a near-surface field using p ++–p junction formed by diffusion of boron into the silicon with resistivity of 3 kΩ · cm. The pulling field is also formed in the space charge region between p ++ - and n ++ -regions. Diffusion of phosphorus was carried out to create the n ++ -region. Numerical calculations of potential distribution, concentration of free charge carriers and currents were carried out using software for 1D- and 2D-modelling (SimWin and TCAD Synopsys).

Results. 2D-calculation of charge carrier concentration and potential distribution was performed. The study determined the minimum bias for the complete depletion of the i-layer, including that for longitudinal grooves of various depths. The strip was tested as part of a hybrid photoelectric device by irradiating light pulses from IR LED. When the voltage on the diodes was reached –270 V, the duration of the signal front on all channels was 5…9 ns.

Conclusion. For use in IR-hybrid detectors, a strip of 12 silicon pin-diodes was developed with a sensitive element of 24 × 0.2 mm in dimension. The study of pulse characteristics showed that the necessary duration of the front signal on all channels was achieved without thinning thus satisfying the requirements for high-speed position-sensitive sensor of the infrared radiation.

About the Authors

Mikhail R. Ainbund
JSC "NRI "Electron"
Russian Federation

Mikhail R. Ainbund, Cand. Sci. (Eng.) (1974), Head of Department JSC «NRI «Electron». The author of more than 100 scientific publications. Area of expertise: photoelectronics, solid state physics, hybrid photoelectric devices, solid state matrix photoelectric devices.

68 Toreza Ave., St Petersburg 194223, Russia



Denis E. Mironov
JSC "NRI "Electron"
Russian Federation

Denis Ye. Mironov, Engineer on Radio engineering (1999, St Petersburg State University of Telecommunications), Leading Researcher of JSC «NRI «Electron». The author of 11 scientific publications. Area of expertise: photoelectronics, radio engineering, hybrid photoelectric devices, solid state matrix photoelectric devices.

68 Toreza Ave., St Petersburg 194223, Russia



Andrey V. Pashuk
JSC "NRI "Electron"
Russian Federation

Andrey V. Pashuk, Head of Laboratory JSC «NRI «Electron». The author of 28 scientific publications. Area of expertise: photoelectronics, hybrid photoelectric devices, IR-technique, solid state matrix photoelectric devices.

68 Toreza Ave., St Petersburg 194223, Russia



Vasily I. Zubkov
Saint Petersburg Electrotechnical University
Russian Federation

Vasily I. Zubkov, Dr. Sci. (Phys.) (2008), Professor (2018) of Department of Micro- and Nanoelectronics Saint Petersburg Electrotechnical University. The author of more than 170 scientific publications. Area of expertise: solid state physics and physics of semiconductors, nanoelectronics, simulation and diagnostics of quantum-sized structures.

5 Professor Popov Str., St Petersburg 197376, Russia



Alexander V. Solomonov
Saint Petersburg Electrotechnical University
Russian Federation

Alexander V. Solomonov, Dr. Sci. (Phys.) (2000), Professor (2002), Dean of Faculty of Electronics, Professor of Department of Micro- and Nanoelectronics Saint Petersburg Electrotechnical University. The author of more than 140 scientific publications. Area of expertise: microelectronics and optics of semiconductors, nanoelectronics, quantum-sized heterostructures.

5 Professor Popov Str., St Petersburg 197376, Russia



Vladimir V. Zabrodskii
Ioffe Institute
Russian Federation

Vladimir V. Zabrodskii, Engineer on Microelectronics (2001), Saint Petersburg Electrotechnical University, Research Fellow of Ioffe Institute. The author of 32 scientific publications. Area of expertise: photoelectronics, silicon photodiodes, technology of semiconductor diodes.

26 Politekhnicheskaya Str., St Petersburg 194021, Russia



Andrey V. Nikolaev
Ioffe Institute
Russian Federation

Andrey V. Nikolaev, Cand. Sci. (Chem.) (2013), Research Fellow of Ioffe Institute. The author of 9 scientific publications. Area of expertise: photoelectronics, silicon photodiodes, technology of semiconductor diodes.

26 Politekhnicheskaya Str., St Petersburg 194021, Russia



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Review

For citations:


Ainbund M.R., Mironov D.E., Pashuk A.V., Zubkov V.I., Solomonov A.V., Zabrodskii V.V., Nikolaev A.V. Back-Side Electron-Bombarded Silicon pin-Strip. Journal of the Russian Universities. Radioelectronics. 2019;22(5):80-92. https://doi.org/10.32603/1993-8985-2019-22-5-80-92

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ISSN 1993-8985 (Print)
ISSN 2658-4794 (Online)