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Study of Parameters Affecting Breakdown Voltage of Bipolar Static Induction Transistor

Abstract

The article considers structural and technological parameters affecting breakdown voltage of a BSIT transistor cell. The main objective of the scientific research in that field is optimization of manufacturing techniques of power electronics transistor configurations in order to improve the instrument output characteristics and reliability. One of the key electrical parameters characterizing this instrument is breakdown voltage. In p-n junction at specific value of reverse bias the breakdown effect is present that appears as sharp increase of reverse current in p-n junction. For thermal breakdown to occur the thermal self-heating of the structure is necessary. It takes place in case of considerable reverse current in p-n junction. Typically, thermal breakdown happens after tunnel or avalanche breakdown of p-n junction. Breakdown voltage of real diffused p-n junction is defined by value of avalanche breakdown voltage of spherical part of the junction. Thus, breakdown voltage of p-n of junction strongly depends on its geometry.

About the Authors

T. A. Ismailov
Dagestan State Technical University
Russian Federation
D.Sc. in Engineering (1992), Professor (1994), Chancellor,  Honored Scientist of the RF


A. R. Shakhmaeva
Dagestan State Technical University
Russian Federation
Ph.D. in Engineering (2010), Associate Professor of the Department of Management and Information Technologies in Engineering Systems Computer Engineering, Dean of the Advanced Training and Professional Retraining Faculty


B. A. Shangereeva
Dagestan State Technical University
Russian Federation
Ph.D. in Engineering (2010), Associate Professor of the Department of Theoretical and General Electrical Engineering


References

1. Ismailov T. A., Magomedov K. A., Gadzhiev Kh. M., Shakhmaeva A. R. Bipolar Static Induction Transistors (BSIT). Vestnik. Dagestanskogo gosudarstvenno-go tekhnicheskogo universiteta. Tekhnicheskie nauki, 1998, vol. 2, pp. 97-100. (In Russian)

2. Ismailov T. A., Shakhmaeva A. R., Bukashev F. I., Zakharova P. R. Tekhnologiya, konstruktsii, metody modelirovaniya i primenenie BSIT-tranzistorov [BSIT transistors technology, design, modeling techniques and application]. Moscow, Akademiya, 2012, 252 p. (In Russian)

3. Shakhmaeva A. R., Zakharova P. R. Structural and technological methods for improving semiconductor device parameters. Vestnik Saratovskogo gosudarstvennogo tekhnicheskogo universiteta, 2012, vol. 1(63), iss. 1, pp. 36-40. (In Russian)

4. Grishina L. M., Pavlov V. V. Polevye tranzistory. Spravochnik [ Field transistors. Directory]. Moscow, Radio i svyaz', 1982, 72 p. (In Russian)

5. Shakhmaeva A. R. Shangereeva B. A., Aliev Sh. D. Bipolar static induction transistors and some ways to improve their manufacturing technologies. Vestnik Dagestanskogo nauchnogo tsentra, 2007, vol. 27, pp. 23-25. (In Russian)

6. Ismailov T. A., Shakhmaeva A. R., Fomin Yu. G. Structural and technological characteristics of bipolar static induction transistors. Vestnik Dage-stanskogo gosudarstvennogo tekhnicheskogo universiteta. Tekhnicheskie nauki, 2008, vol. 10, pp. 17-21. (In Russian)

7. Khalikeeva V. M. Otechestvennye tranzistory: BSIT, SIT, BTIZ [Transistors of domestic manufacture: BSIT, SIT, IGBT]. Moscow, Izd.dom "Dodeka-XXI", 2001, 64 p. (In Russian)


Review

For citations:


Ismailov T.A., Shakhmaeva A.R., Shangereeva B.A. Study of Parameters Affecting Breakdown Voltage of Bipolar Static Induction Transistor. Journal of the Russian Universities. Radioelectronics. 2017;(2):23-27. (In Russ.)

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ISSN 1993-8985 (Print)
ISSN 2658-4794 (Online)