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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">radioelectronics</journal-id><journal-title-group><journal-title xml:lang="ru">Известия высших учебных заведений России. Радиоэлектроника</journal-title><trans-title-group xml:lang="en"><trans-title>Journal of the Russian Universities. Radioelectronics</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1993-8985</issn><issn pub-type="epub">2658-4794</issn><publisher><publisher-name>Saint Petersburg Electrotechnical University</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">radioelectronics-79</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ПРОЕКТИРОВАНИЕ И ТЕХНОЛОГИЯ РАДИОЭЛЕКТРОННЫХ СРЕДСТВ</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>ENGINEERING DESIGN AND TECHNOLOGIES OF RADIO ELECTRONIC FACILITIES</subject></subj-group></article-categories><title-group><article-title>Исследование температурных зависимостей вольт-амперных характеристик тонкопленочных конденсаторов на основе твердых растворов титаната бария стронция</article-title><trans-title-group xml:lang="en"><trans-title>Investigation of temperature dependent current-voltage characteristics of Ba0.5Sr0.5TiO3 thin films</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Белявский</surname><given-names>П. Ю.</given-names></name><name name-style="western" xml:lang="en"><surname>Belyavskiy</surname><given-names>P. Y.</given-names></name></name-alternatives><email xlink:type="simple">pbeliavskiy@gmail.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Плотников</surname><given-names>В. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Plotnikov</surname><given-names>V. V.</given-names></name></name-alternatives><email xlink:type="simple">bauhaus.1919.bela.lugosi@gmail.com</email><xref ref-type="aff" rid="aff-2"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru">Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" им. В. И. Ульянова (Ленина)<country>Россия</country></aff><aff xml:lang="en">Saint Petersburg Electrotechnical University "LETI"<country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru">Санкт-Петербургский национальный исследовательский университет информационных технологий, механики и оптики "ИТМО"<country>Россия</country></aff><aff xml:lang="en">ITMO University<country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2016</year></pub-date><pub-date pub-type="epub"><day>28</day><month>02</month><year>2016</year></pub-date><volume>0</volume><issue>1</issue><fpage>38</fpage><lpage>43</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Белявский П.Ю., Плотников В.В., 2016</copyright-statement><copyright-year>2016</copyright-year><copyright-holder xml:lang="ru">Белявский П.Ю., Плотников В.В.</copyright-holder><copyright-holder xml:lang="en">Belyavskiy P.Y., Plotnikov V.V.</copyright-holder><license license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://re.eltech.ru/jour/article/view/79">https://re.eltech.ru/jour/article/view/79</self-uri><abstract><p>Методом реактивного высокочастотного катодного распыления синтезированы пленки Ba0.5Sr0.5TiO3 (BST) на подложках из сапфира и гадолиний-галлиевого граната. Проведен ана-лиз вольт-амперных характеристик в температурном диапазоне с целью выяснения природы то-ков утечки в синтезированных диэлектриках. Установлено, что формирование токов утечки в указанных пленках происходит благодаря процессу переноса носителей заряда по типу эмиссии Шотки. Вольт-амперным методом определен ряд фундаментальных величин пленок BST: высота барьера Шотки; эффективная масса носителей заряда и динамическая диэлектрическая прони-цаемость. Установлено влияние материала подложки на электрофизические свойства пленок BST. </p></abstract><trans-abstract xml:lang="en"><p>The Ba0.5Sr0.5TiO3 (BST) thin films were deposited via radio frequency cathode sputtering on sapphire (α-Al2O3) and gadolinium gallium garnet (GGG) substrates. The effect of substrate material on the leakage current and mechanism of conductivity in BST stacks has been studied by tempera-ture dependent (300…400 K) current-voltage characteristics. Lower leakage currents of BST/α-Al2O3 thin films were achieved compared with that of BST/GGG thin films, especially in the high field re-gion. The conduction mechanism of the deposited films is found to be of Schottky emission type for a wide range of applied fields on both substrates. Schottky barrier height, effective Richardson con-stant, effective mass of conduction electrons in dielectric, and dynamic dielectric constant within the bounds of thermionic emission theory were found. </p></trans-abstract><kwd-group xml:lang="ru"><kwd>Явления переноса</kwd><kwd>диэлектрик</kwd><kwd>механизмы проводимости</kwd><kwd>эмиссия Шотки</kwd></kwd-group><kwd-group xml:lang="en"><kwd>Transport Phenomenon</kwd><kwd>Dielectric</kwd><kwd>Conduction Mechanisms</kwd><kwd>Schottky Emission</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Пятаков А. П., Звездин А. К. 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