<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">radioelectronics</journal-id><journal-title-group><journal-title xml:lang="ru">Известия высших учебных заведений России. Радиоэлектроника</journal-title><trans-title-group xml:lang="en"><trans-title>Journal of the Russian Universities. Radioelectronics</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1993-8985</issn><issn pub-type="epub">2658-4794</issn><publisher><publisher-name>Saint Petersburg Electrotechnical University</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.32603/1993-8985-2026-29-3-35-43</article-id><article-id custom-type="elpub" pub-id-type="custom">radioelectronics-1164</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>МИКРО- И НАНОЭЛЕКТРОНИКА</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>MICRO- AND NANOELECTRONICS</subject></subj-group></article-categories><title-group><article-title>Исследование влияния степени легирования квантовых ям на рабочую температуру QWIP</article-title><trans-title-group xml:lang="en"><trans-title>Investigation of the Effect of Quantum Well Doping on QWIP Operating Temperature</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0009-0007-2005-4304</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Дудин</surname><given-names>А. Л.</given-names></name><name name-style="western" xml:lang="en"><surname>Dudin</surname><given-names>A. L.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Дудин Анатолий Леонидович – специалист в области физики и технологии полупроводниковых приборов (1996, Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" им. В. И. Ульянова (Ленина)), заместитель генерального директора по производству и технологическим разработкам</p><p>пр. Энгельса, д. 27, Санкт-Петербург, 194156 </p></bio><bio xml:lang="en"><p>Anatoliy L. Dudin, Specialist in Physics and Technology of Semiconductor Devices (1996, Saint Petersburg Electrotechnical University), Chief Technologist</p><p>27, Engelsa Ave., St Petersburg 194156 </p></bio><email xlink:type="simple">a.dudin@svrost.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0001-6830-6899</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Зубков</surname><given-names>В. И.</given-names></name><name name-style="western" xml:lang="en"><surname>Zubkov</surname><given-names>V. I.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Зубков Василий Иванович – доктор физико-математических наук (2008), профессор (2018), профессор кафедры микро- и наноэлектроники</p><p>ул. Проф. Попова, д. 5 Ф, Санкт-Петербург, 197022 </p></bio><bio xml:lang="en"><p>Vasily I. Zybkov, Dr Sci. (Phys. and Math.) (2008), Professor (2018) of the Department of Micro- and Nanoelectronics</p><p>5 F, Professor Popov St., St Petersburg 197022 </p></bio><email xlink:type="simple">vzubkovspb@mail.ru</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0009-0002-9538-1055</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Богословская</surname><given-names>Л. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Bogoslovskaya</surname><given-names>L. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Богословская Лана Сергеевна – магистр по специальности "Нанотехнологии и микросистемная техника" (2023, Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" им. В. И. Ульянова (Ленина)), аспирантка, инженер-технолог, сквозной технолог по направлению QWIP</p><p>пр. Энгельса, д. 27, Санкт-Петербург, 194156 </p></bio><bio xml:lang="en"><p>Lana S. Bogoslovskaya, Master in Nanotechnology and Microsystem Engineering (2023, Saint Petersburg Electrotechnical University), Postgraduate student, engineertechnologist. End-to-end technologist in the QWIP direction</p><p>27, Engelsa Ave., St Petersburg 194156 </p></bio><email xlink:type="simple">Lana.stoliarowa@yandex.ru</email><xref ref-type="aff" rid="aff-3"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>АО "Светлана-Рост"</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Joint Stock Company "Svetlana-Rost"</institution><country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" им. В. И. Ульянова (Ленина)</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Saint Petersburg Electrotechnical University</institution><country>Russian Federation</country></aff></aff-alternatives><aff-alternatives id="aff-3"><aff xml:lang="ru"><institution>Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" им. В. И. Ульянова (Ленина) ; АО "Светлана-Рост"</institution><country>Россия</country></aff><aff xml:lang="en"><institution>Saint Petersburg Electrotechnical University ; Joint Stock Company "Svetlana-Rost"</institution><country>Russian Federation</country></aff></aff-alternatives><pub-date pub-type="collection"><year>2026</year></pub-date><pub-date pub-type="epub"><day>14</day><month>07</month><year>2026</year></pub-date><volume>29</volume><issue>3</issue><fpage>35</fpage><lpage>43</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Дудин А.Л., Зубков В.И., Богословская Л.С., 2026</copyright-statement><copyright-year>2026</copyright-year><copyright-holder xml:lang="ru">Дудин А.Л., Зубков В.И., Богословская Л.С.</copyright-holder><copyright-holder xml:lang="en">Dudin A.L., Zubkov V.I., Bogoslovskaya L.S.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://re.eltech.ru/jour/article/view/1164">https://re.eltech.ru/jour/article/view/1164</self-uri><abstract><p>Введение. Инфракрасные фотодетекторы на основе квантовых ям (QWIP) являются одними из ключевых компонентов современных систем инфракрасного видения. QWIP широко применяются в различных областях, включая космические исследования, медицину и др. Одна из ключевых характеристик QWIP – температура BLIP (background limited performance). Эта температура определяется из условия равенства фонового и темнового токов, протекающих через фотодетектор, и является рабочей температурой фотодетектора. Увеличение рабочей температуры позволяет значительно снизить требования к системе охлаждения. Поскольку фоновый ток зависит от условий окружающей среды и апертуры криостата, целесообразно снижать значения темнового тока, которые напрямую зависят от степени легирования квантовых ям. Однако легирование влияет на чувствительность фотодетектора, поэтому необходимо подобрать оптимальный уровень легирования, позволяющий найти компромисс между снижением чувствительности и уровня темнового тока.Цель работы. Исследование влияния степени легирования квантовых ям на основе системы материалов GaAs/AlGaAs на температуру BLIP.Материалы и методы. Для проведения эксперимента методом молекулярно-пучковой эпитаксии были изготовлены тестовые фотоприемники. Параметры образцов подбирались таким образом, чтобы длина волны максимума спектральной чувствительности находилась в диапазоне 8…9 мкм. Варьируемым параметром являлась степень легирования квантовых ям кремнием. После прохождения технологического маршрута планарной модификации на всех тестовых фотоприемниках были сняты вольт-амперные характеристики в диапазоне температур 65…77 К и построены графики статической токовой чувствительности.Результаты. Показано, что снижение уровня легирования с 9.0·1017 до 4.5·1017 см–3 приводит к значительному уменьшению темнового тока в рабочем интервале напряжений. Это позволило повысить температуру BLIP с 69 до 71 К. При этом наблюдалось ожидаемое снижение фоточувствительности, однако ее значение оставалось выше порогового уровня 0.15 А/Вт.Заключение. Полученные данные демонстрируют, что оптимизация уровня легирования квантовых ям в QWIP позволяет уменьшить уровень темнового тока фотодетектора. Такой фотодетектор можно использовать при более высоких температурах.</p></abstract><trans-abstract xml:lang="en"><p>Introduction. Quantum well infrared photodetectors (QWIPs) are among the key components of modern infrared imaging systems and are widely used for various applications, including space research, medical diagnostics, etc. One of the most important characteristics of a QWIP is the background-limited performance (BLIP) temperature, which is determined based on the equality condition between the background current and the dark current flowing through the photodetector. This parameter represents the operating temperature of the photodetector. Increasing the operating temperature can significantly reduce the requirements imposed on the cooling system. Since the background current depends on environmental conditions and the cryostat aperture, it is primarily requir ed to reduce the dark current values. The dark current is strongly dependent on the doping level of the quantum wells. However, the doping concentration also affects the photodetector sensitivity, creating a trade-off between sensitivity and dark current level.Aim. To investigate the effect of the doping level of quantum wells based on the GaAs/AlGaAs material system on the BLIP temperature.Materials and methods. Experimental photodetectors were fabricated by molecular beam epitaxy. The parameters of the samples were selected to ensure a peak spectral response wavelength in the range of 8…9 μm. The variable parameter was the doping level of the quantum wells with silicon. After completing the planar processing technological route, the current–voltage characteristics of all test photodetectors were measured in the temperature range of 65…77 K, and the corresponding curves of static current sensitivity were plotted.Results. A reduction in the doping level from 9.0·1017 to 4.5·1017 cm–3 was found to lead to a significant decrease in the dark current within the operating voltage range. This made it possible to increase the BLIP temperature from 69 to 71 K. This was associated with the expected decrease in photosensitivity; however, its value remained above the threshold level of 0.15 A/W.Conclusion. The obtained data demonstrate that optimization of the quantum well doping level in QWIPs provides for a reduction in the photodetector dark current. As a result, the device can be operated at higher temperatures.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>инфракрасные фотодетекторы с квантовыми ямами</kwd><kwd>темновой ток</kwd><kwd>фоточувствительность</kwd><kwd>вольт-амперные характеристики</kwd><kwd>BLIP</kwd></kwd-group><kwd-group xml:lang="en"><kwd>quantum well infrared photodetectors</kwd><kwd>dark current</kwd><kwd>photosensitivity</kwd><kwd>current–voltage characteristics</kwd><kwd>BLIP</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Mid-infrared semiconductor optoelectronics / ed. by A. Krier. London: Springer, 2007. 752 p. doi: 10.1007/1-84628-209-8</mixed-citation><mixed-citation xml:lang="en">Mid-Infrared Semiconductor Optoelectronics. Ed. by Krier A. London, Springer, 2007, 752 p. doi: 10.1007/1-84628-209-8</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">QWIP: still the best solution for high-end applications in LWIR / R. Ivanov, S. Högnadóttir, D. Ramos, D. Evans, D. Visser, D. Rihtnesberg, A. Smuk, S. Becanovic, S. Sehlin, S. Almqvist, S. Smuk, L. Höglund, E. Costard // Infrared Technology and Applications XLIX. Proc. of SPIE. 2023. Vol. 12534. P. 356–364.</mixed-citation><mixed-citation xml:lang="en">Ivanov R., Högnadóttir S., Ramos D., Evans D., Visser D., Rihtnesberg D., Smuk A., Becanovic S., Sehlin S., Almqvist S., Smuk S., Höglund L., Costard E. QWIP: Still the Best Solution for High-End Applications in LWIR. Infrared Technology and Applications XLIX. Proc. of SPIE. 2023, vol. 12534, pp. 356–364.</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">Quantum well infrared photodetector research and development at Jet Propulsion Laboratory / S. D. Gunapala, S. V. Bandara, J. K. Liu, E. M. Luong, S. B. Rafol, J. M. Mumolo, D. Z. Ting, J. J. Bock, M. E. Ressler, M. W. Werner, P. D. LeVan, R. Chehayeb, A. Kukkonen, M. Levy, P. LeVan, M. A. Fauci // Infrared Physics &amp; Technology. 2001. Vol. 42, iss. 3–5. P. 267–282. doi: 10.1016/S1350-4495(01)00085-8</mixed-citation><mixed-citation xml:lang="en">Gunapala S. D., Bandara S. V., Liu J. K., Luong E. M., Rafol S. B., Mumolo J. M., Ting D. Z., Bock J. J., Ressler M. E., Werner M. W., LeVan P. D., Chehayeb R., Kukkonen A., Levy M., LeVan P., Fauci M. A. Quantum Well Infrared Photodetector Research and Development at Jet Propulsion Laboratory. Infrared Physics &amp; Technology. 2001, vol. 42, iss. 3–5, pp. 267–282. doi: 10.1016/S1350-4495(01)00085-8</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">QWIP structural optimization / K.-K. Choi, C.-H. Lin, K.-M. Leung, T. Tamir // Materials for Infrared Detectors II. Proc. of SPIE. 2002. Vol. 4795. P. 27–38. doi: 10.1117/12.453827</mixed-citation><mixed-citation xml:lang="en">Choi K.-K., Lin C.-H., Leung K.-M., Tamir T. QWIP Structural Optimization. Materials for Infrared Detectors II. Proc. of SPIE. 2002, vol. 4795, pp. 27–38. doi: 10.1117/12.453827</mixed-citation></citation-alternatives></ref><ref id="cit5"><label>5</label><citation-alternatives><mixed-citation xml:lang="ru">Berurier A., Nedelcu A. Optimization of light polarization sensitivity in QWIP detectors // Infrared Physics &amp; Technology. 2013. Vol. 59. P. 118–124. doi: 10.1016/j.infrared.2012.12.025</mixed-citation><mixed-citation xml:lang="en">Berurier A., Nedelcu A. Optimization of Light Polarization Sensitivity in QWIP Detectors. Infrared Physics &amp; Technology. 2013, vol. 59, pp. 118–124. doi: 10.1016/j.infrared.2012.12.025</mixed-citation></citation-alternatives></ref><ref id="cit6"><label>6</label><citation-alternatives><mixed-citation xml:lang="ru">An LWIR QWIP FPA with sub-5mK NETD and large dynamic range / H. Lu, N. Li, X. Zhou, Zh. Li, P. Chen, J. Xu, X. Li, W. Lu // Infrared Physics &amp; Technology. 2025. Vol. 144. Art. № 105629. doi: 10.1016/j.infrared.2024.105629</mixed-citation><mixed-citation xml:lang="en">Lu H., Li N., Zhou X., Li Zh., Chen P., Xu J., Li X., Lu W. An LWIR QWIP FPA with Sub-5mK NETD and Large Dynamic Range. Infrared Physics &amp; Technology. 2025, vol. 144, art. no. 105629. doi: 10.1016/j.infrared.2024.105629</mixed-citation></citation-alternatives></ref><ref id="cit7"><label>7</label><citation-alternatives><mixed-citation xml:lang="ru">Das M. K., Lal R. K. Modeling of Quantum Well Infrared Photo Detector for Long Wavelength Infrared Detection // IETE J. of Research. 2017. Vol. 63, iss. 5. P. 719–727. doi: 10.1080/03772063.2017.1313138</mixed-citation><mixed-citation xml:lang="en">Das M. K., Lal R. K. Modeling of Quantum Well Infrared Photo Detector for Long Wavelength Infrared Detection. IETE J. of Research. 2017, vol. 63, iss. 5, pp. 719–727. doi: 10.1080/03772063.2017.1313138</mixed-citation></citation-alternatives></ref><ref id="cit8"><label>8</label><citation-alternatives><mixed-citation xml:lang="ru">Optimisation of QWIP detectors for space applications / S. Smuk, A. Gromov, J. Alverbro, P. Merken, T. Souverijns, D. Haga, H. Malm, C. Asplund, J. Borglind, S. Becanovic, P. Tinghag, H. Martijn, B. Hirschauer // Sensors, Systems, and Next-Generation Satellites IX. Proc. of SPIE. 2005. Vol. 5978. P. 397–406. doi: 10.1117/12.632799</mixed-citation><mixed-citation xml:lang="en">Smuk S., Gromov A., Alverbro J., Merken P., Souverijns T., Haga D., Malm H., Asplund C., Borglind J., Becanovic S., Tinghag P., Martijn H., Hirschauer B. Optimisation of QWIP Detectors for Space Applications. Sensors, Systems, and Next-Generation Satellites IX. Proc. of SPIE. 2005, vol. 5978, pp. 397–406. doi: 10.1117/12.632799</mixed-citation></citation-alternatives></ref><ref id="cit9"><label>9</label><citation-alternatives><mixed-citation xml:lang="ru">Etteh N. E. I., Harrison P. Quantum mechanical scattering investigation of the dark current in quantum well infrared photodetectors (QWIPs) // Infrared Physics &amp; Technology. 2003. Vol. 44, iss. 5–6. P. 473–480. doi: 10.1016/S1350-4495(03)00169-5</mixed-citation><mixed-citation xml:lang="en">Etteh N. E. I., Harrison P. Quantum Mechanical Scattering Investigation of the Dark Current in Quantum Well Infrared Photodetectors (QWIPs). Infrared Physics &amp; Technology. 2003, vol. 44, iss. 5–6, pp. 473–480. doi: 10.1016/S1350-4495(03)00169-5</mixed-citation></citation-alternatives></ref><ref id="cit10"><label>10</label><citation-alternatives><mixed-citation xml:lang="ru">Downs C., Vandervelde T. E. Progress in infrared photodetectors since 2000 // Sensors. 2013. Vol. 13, iss. 4. P. 5054–5098. doi: 10.3390/s130405054</mixed-citation><mixed-citation xml:lang="en">Downs C., Vandervelde T. E. Progress in Infrared Photodetectors Since 2000. Sensors. 2013, vol. 13, iss. 4, pp. 5054–5098. doi: 10.3390/s130405054</mixed-citation></citation-alternatives></ref><ref id="cit11"><label>11</label><citation-alternatives><mixed-citation xml:lang="ru">Bhan R. K., Dhar V. Recent infrared detector technologies, applications, trends and development of HgCdTe based cooled infrared focal plane arrays and their characterization // Opto-Electronics Review. 2019. Vol. 27, № 2. P. 174–193. doi: 10.1016/j.opelre.2019.04.004</mixed-citation><mixed-citation xml:lang="en">Bhan R. K., Dhar V. Recent Infrared Detector Technologies, Applications, Trends and Development of HgCdTe Based Cooled Infrared Focal Plane Arrays and Their Characterization. Opto-Electronics Review. 2019, vol. 27, no. 2, pp. 174–193. doi: 10.1016/j.opelre.2019.04.004</mixed-citation></citation-alternatives></ref><ref id="cit12"><label>12</label><citation-alternatives><mixed-citation xml:lang="ru">Schneider H., Liu H. C. Quantum well infrared photodetectors: physics and applications. Berlin, Heidelberg : Springer, 2007. 248 p. doi: 10.1007/978-3-540-36324-8</mixed-citation><mixed-citation xml:lang="en">Schneider H., Liu H. C. Quantum Well Infrared Photodetectors: Physics and Applications. Berlin, Heidelberg, Springer, 2007, 248 p. doi: 10.1007/978-3-540-36324-8</mixed-citation></citation-alternatives></ref><ref id="cit13"><label>13</label><citation-alternatives><mixed-citation xml:lang="ru">Богословская Л. С., Дудин А. Л., Зубков В. И. Исследование влияния ширины барьера на рабочее напряжение QWIP // Изв. вузов России. Радиоэлектроника. 2024. Т. 27, № 4. С. 72–80. doi: 10.32603/1993-8985-2024-27-4-72-80</mixed-citation><mixed-citation xml:lang="en">Bogoslovskaya L. S., Dudin A. L., Zubkov V. I. Influence of Barrier Width on QWIP Operating Voltage. J. of the Russian Universities. Radioelectronics. 2024, vol. 27, no. 4, pp. 72–80. doi: 10.32603/1993-8985-2024-27-4-72-80</mixed-citation></citation-alternatives></ref><ref id="cit14"><label>14</label><citation-alternatives><mixed-citation xml:lang="ru">GaAs/AIGaAs Quantenfilm Photodetektoren für Kameras im 8...12µm-Bereich / H. Schneider, P. Koidl, M. Walther, J. Fleißner, J. Ziegler // tm-Technisches Messen. 1999. Vol. 66, № 9. P. 344–349.</mixed-citation><mixed-citation xml:lang="en">Schneider H., Koidl P., Walther M., Fleißner J., Ziegler J. GaAs/AIGaAs Quantenfilm Photodetektoren für Kameras im 8...12µm-Bereich. tm-Technisches Messen. 1999, vol. 66, no. 9, pp. 344–349.</mixed-citation></citation-alternatives></ref><ref id="cit15"><label>15</label><citation-alternatives><mixed-citation xml:lang="ru">Billaha A., Das M. K. Influence of doping on the performance of GaAs/AlGaAs QWIP for long wavelength applications // Opto-Electronics Review. 2016. Vol. 24, № 1. P. 25–33. doi: 10.1515/oere-2016-0006</mixed-citation><mixed-citation xml:lang="en">Billaha A., Das M. K. Influence of Doping on the Performance of GaAs/AlGaAs QWIP for Long Wavelength Applications. Opto-Electronics Review. 2016, vol. 24, no. 1, pp. 25–33. doi: 10.1515/oere-2016-0006</mixed-citation></citation-alternatives></ref><ref id="cit16"><label>16</label><citation-alternatives><mixed-citation xml:lang="ru">I–V characterization of a quantum well infrared photodetector with stepped and graded barriers / F. Nutku, A. Erol, M. Gunes, L. B. Buklu, Y. Ergun, M. C. Arikan // Superlattices and Microstructures. 2012. Vol. 52, № 3. P. 585–593. doi: 10.1016/j.spmi.2012.06.010</mixed-citation><mixed-citation xml:lang="en">Nutku F., Erol A., Gunes M., Buklu L. B., Ergun Y., Arikan M. C. I–V Characterization of a Quantum Well Infrared Photodetector with Stepped and Graded Barriers. Superlattices and Microstructures. 2012, vol. 52, no. 3, pp. 585–593. doi: 10.1016/j.spmi.2012.06.010</mixed-citation></citation-alternatives></ref><ref id="cit17"><label>17</label><citation-alternatives><mixed-citation xml:lang="ru">Optimal doping density for quantum-well infrared photodetector performance / Y. Yang, H. C. Liu, W. Z. Shen, N. Li, W. Lu, Z. R. Wasilewski // IEEE J. of Quantum Electronics. 2009. Vol. 45, № 6. P. 623–628. doi: 10.1109/JQE.2009.2013119</mixed-citation><mixed-citation xml:lang="en">Yang Y., Liu H. C., Shen W. Z., Li N., Lu W., Wasilewski Z. R. Optimal Doping Density for Quantum-Well Infrared Photodetector Performance. IEEE J. of Quantum Electronics. 2009, vol. 45, no. 6, pp. 623–628. doi: 10.1109/JQE.2009.2013119</mixed-citation></citation-alternatives></ref><ref id="cit18"><label>18</label><citation-alternatives><mixed-citation xml:lang="ru">Стандартизация технологий изготовления матриц для охлаждаемых тепловизоров – "тепло" или "холодно"? / А. Л. Дудин, Н. И. Кацавец, Д. М. Красовицкий, А. Г. Филаретов, В. П. Чалый // Электроника: наука, технология, бизнес. 2022. № 2. С. 114–119. doi: 10.22184/1992-4178.2022.213.2.114.119</mixed-citation><mixed-citation xml:lang="en">Dudin A. L., Katsavets N. I., Krasovitsky D. M., Filaretov A. G., Chaly V. P. Standardization of Manufacturing Technologies for Matrices for Cooled Thermal Imagers: "Hot" or "Cold"? Electronics: Science, Technology, Business. 2022, no. 2, pp. 114–119. doi: 10.22184/1992-4178.2022.213.2.114.119</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
